Article: Electronic circuits printed at one micron resolution

A research team consisting of a group from National Institute for Materials Science (NIMS) International Center for Materials Nanoarchitectonics (MANA) and Colloidal Ink developed a printing technique for forming electronic circuits and thin-film transistors (TFTs) with line width and line spacing both being 1 μm. This study was supported by a Grant for Advanced Industrial Technology Development from NEDO.

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